ログイン
English
千葉大学学術成果リポジトリ
ブラウズ
著者
刊行年(西暦)
雑誌名
資料種別
ランキング
アクセスランキング
ダウンロードランキング
その他
アカデミック・リンク・センター/附属図書館HP
千葉大学HP
このアイテムのアクセス数:
27
件
(
2024-11-13
07:38 集計
)
閲覧可能ファイル
ファイル
フォーマット
サイズ
ダウンロード回数
説明
appl_phys_lett_114-231603
pdf
958 KB
121
基本情報
データ種別:学術成果リポジトリ
タイトル
Effects of gas cluster ion beam sputtering on the molecular orientation of organic semiconductor films : Ultraviolet photoelectron spectroscopy study of [6]phenacene
作成者
ARAI, Ryoji
NISHI, Toshio
KUDO, Yoshihiro
YOSHIDA, Hiroyuki
TOMIYA, Shigetaka
作成者の別表記
吉田, 弘幸
内容
[ABSTRACT] The alignment of organic layer and metal layer energy levels within organic semiconductor devices is critical for efficient charge injection/collection at the electrodes. The electronic structure at the interface is usually examined using ultraviolet photoelectron spectroscopy (UPS) as the film thickness of the organic layer is built up incrementally (bottom-up method). As such, the morphology and crystallinity of the films that are examined using this technique may be different from the films used in actual devices because these properties are sensitive to the way in which the films are prepared. We have prepared [6]phenacene thin films with standing and lying molecular orientations on naturally oxidized silicon (SiO2) and highly oriented pyrolytic graphite (HOPG) surfaces, respectively. UPS measurements were performed on films that were incrementally decreased in thickness using gas cluster ion beam (GCIB) sputtering (top-down method). The spectral shapes and ionization energies of the films that were formed using the bottom-up and top-down methods were similar. Importantly, the characteristic features of a monolayer on the HOPG substrate were also observed when a thick film (i.e., not built up in layers using the bottom-up method) was thinned down by GCIB sputtering. We have shown that UPS combined with GCIB sputtering is a useful technique for examining the energy level alignment of interfaces within films that are fabricated using conditions similar to those used for real devices.
ハンドルURL
https://opac.ll.chiba-u.jp/da/curator/108507/
フルテキストへのリンク
https://opac.ll.chiba-u.jp/da/curator/108507/appl_phys_lett_114-231603.pdf
公開者
AIP Publishing
NII資源タイプ
学術雑誌論文
ISSN
0003-6951
1077-3118
掲載誌名
Applied Physics Letters
巻
114
開始ページ
231603
刊行年月
2019-06-11
DOI(出版者版)
10.1063/1.5094952
著者版フラグ
publisher
権利関係
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters 114, 231603 (2019) and may be found at https://aip.scitation.org/doi/10.1063/1.5094952.
その他の情報を表示
DCMI資源タイプ
text
ファイル形式 [IMT]
application/pdf
言語 [ISO639-2]
eng
関連情報 (isVersionOf) [URL]
https://aip.scitation.org/doi/10.1063/1.5094952
ホームへ戻る